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		<title>DNS on Focused IR Heating Beams</title>
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				<title>DNS (Screen) wafer dryer lamp</title>
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				<pubDate>Fri, 05 Jun 2026 04:16:41 +0800</pubDate>
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				<description>&lt;p&gt;&lt;img src=&#34;http://ir-heat-beam.com/images/0a976f8a438e1a813cc995e9355a4471.png&#34; alt=&#34;DNS (Screen) wafer dryer lamp&#34;&gt;&lt;/p&gt;&#xA;&lt;p&gt;On the lithography floor, a 1°C drift in the soft bake or hard bake isn’t a “small error.” It’s a yield hit, plain and simple. You watch wafers leave the track with edge bead, linewidth spread, or solvent that never fully cleared—residue that shows up later as a defect. What you need is a heat source that treats the whole wafer as one thermal body, not a patchwork of hot and cold spots.&lt;/p&gt;</description>
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